Details

Autor(en) / Beteiligte

• Evans-Lutterodt, Kenneth
• Ablett, James
• Stein, Aaron
• Kao, Chi-Chang
• Tennant, Don
• Klemens, Fred
• Taylor, Ashley
• Jacobsen, Chris
• Gammel, Peter
• Huggins, Harold
• Bogart, Greg
• Ustin, Scott
• Ocola, Leo

Titel

Single-element elliptical hard x-ray micro-optics

Ist Teil von

• Optics express, 2003-04, Vol.11 (8), p.919-926

Ort / Verlag

United States

Erscheinungsjahr

2003

Link zum Volltext

Quelle

Free E-Journal (出版社公開部分のみ）

Beschreibungen/Notizen

• Using micro-fabrication techniques, we have manufactured a single element kinoform lens in single-crystal silicon with an elliptical profile for 12.398 keV (1A) x-rays. By fabricating a lens that is optimized at fixed wavelengths, absorption in the lens material can be significantly reduced by removing 2_ phase-shifting regions. This permits short focal length devices to be fabricated with small radii of curvatures at the lens apex. This feature allows one to obtain a high demagnification of a finite synchrotron electron source size. The reduced absorption loss also enables optics with a larger aperture, and hence improved resolution for focusing and imaging applications. Our first trial of these lenses has resulted in a one micron line focus (fwhm) at the National Synchrotron Light Source X13B beamline.