Details

Autor(en) / Beteiligte

• Schubert, Martin F
• Mont, Frank W
• Chhajed, Sameer
• Poxson, David J
• Kim, Jong Kyu
• Schubert, E Fred

Titel

Design of multilayer antireflection coatings made from co-sputtered and low-refractive-index materials by genetic algorithm

Ist Teil von

• Optics express, 2008-04, Vol.16 (8), p.5290-5298

Ort / Verlag

United States

Erscheinungsjahr

2008

Quelle

MEDLINE

Beschreibungen/Notizen

• Designs of multilayer antireflection coatings made from co-sputtered and low-refractive-index materials are optimized using a genetic algorithm. Co-sputtered and low-refractive-index materials allow the fine-tuning of refractive index, which is required to achieve optimum anti-reflection characteristics. The algorithm minimizes reflection over a wide range of wavelengths and incident angles, and includes material dispersion. Designs of antireflection coatings for silicon-based image sensors and solar cells, as well as triple-junction GaInP/GaAs/Ge solar cells are presented, and are shown to have significant performance advantages over conventional coatings. Nano-porous low-refractive-index layers are found to comprise generally half of the layers in an optimized antireflection coating, which underscores the importance of nano-porous layers for high-performance broadband and omnidirectional antireflection coatings.