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Synthesis of Silicon Nanowires and Nanofin Arrays Using Interference Lithography and Catalytic Etching
Ist Teil von
Nano letters, 2008-11, Vol.8 (11), p.3799-3802
Ort / Verlag
Washington, DC: American Chemical Society
Erscheinungsjahr
2008
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
We report results on the synthesis of silicon nanostructures that were fabricated using a combination of interference lithography and catalytic etching. With this technique, we were able to create nanostructures that are perfectly periodic over very large areas (1 cm2 or more), where the cross-sectional shapes and the array ordering can be varied. Furthermore this technique can readily and independently control the sizes and spacings of the nanostructures down to spacings of 200 nm or less. These characteristics cannot be achieved using other known techniques.