Sie befinden Sich nicht im Netzwerk der Universität Paderborn. Der Zugriff auf elektronische Ressourcen ist gegebenenfalls nur via VPN oder Shibboleth (DFN-AAI) möglich. mehr Informationen...
AlCrNbSiTiV metallic and nitride films were deposited by reactive radio-frequency unbalanced magnetron sputtering. The composition, microstructure and mechanical properties of the coatings deposited at different nitrogen flow rates were evaluated. The deposited AlCrNbSiTiV metallic film has an amorphous structure. The nitride films, regardless of the nitrogen flow ratio, were found to have only an FCC structure register on the XRD profiles. A Stoichiometric nitride ratio, i.e. (Al,Cr,Nb,Si,Ti,V)
50 N
50 is attained for a nitrogen flow ratio (
R
N) of 10% and higher. At the lowest nitrogen flow ratio there is a preferred (200) orientation; however the films become less textured at higher nitrogen flow ratios. Nano-grained structures are obtained for all flow ratios, with grain sizes ranging from 8.7 to 12.3 nm. At the highest nitrogen flow rates the coatings have a compressive stress of around 4.5 GPa. The (Al,Cr,Nb,Si,Ti,V)
50 N
50 nitride coatings have both a high hardness and elastic modulus of 41 and 360 GPa, respectively. The maximum
H/
E ratio occurs at a nitrogen flow ratio of 20%.