Surface & coatings technology, 2007-09, Vol.201 (22), p.9400-9405
2007
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Details
- Autor(en) / Beteiligte
- Titel
- Initiated chemical vapor deposition (iCVD) of polymeric nanocoatings
- Ist Teil von
- Surface & coatings technology, 2007-09, Vol.201 (22), p.9400-9405
- Ort / Verlag
- Lausanne: Elsevier B.V
- Erscheinungsjahr
- 2007
- Quelle
- Alma/SFX Local Collection
- Beschreibungen/Notizen
- Initiated chemical vapor deposition of polymers (iCVD) is a process similar to hot-wire CVD (HWCVD) in which a free-radical initiating species is employed to greatly increase the growth rate while decreasing the required energy input. In general, iCVD allows for the deposition of linear polymer, copolymer and/or crosslinked films with a wide range of functions. Surveyed examples include antimicrobial, superhydrophobic, superhydrophilic, and other functional thin polymer films and coatings.
- Sprache
- Englisch
- Identifikatoren
- ISSN: 0257-8972eISSN: 1879-3347DOI: 10.1016/j.surfcoat.2007.05.003Titel-ID: cdi_proquest_miscellaneous_30096384
- Format
- –
- Schlagworte
- Antimicrobial, Applied sciences, Chemical vapor deposition, Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.), Cross-disciplinary physics: materials science, rheology, Exact sciences and technology, HWCVD, Materials science, Metals. Metallurgy, Methods of deposition of films and coatings, film growth and epitaxy, Nonmetallic coatings, Physics, plasma Polymerization, Polymer coating, Polymer thin film, Production techniques, Surface treatment