Details

Autor(en) / Beteiligte

• Jiang, Aiqin
• Tyson, Trevor A.
• Axe, Lisa
• Gladczuk, Leszek
• Sosnowski, Marek
• Cote, Paul

Titel

The structure and stability of β-Ta thin films

Ist Teil von

• Thin solid films, 2005-05, Vol.479 (1), p.166-173

Ort / Verlag

Lausanne: Elsevier B.V

Erscheinungsjahr

2005

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• Ta films with tetragonal crystalline structure (β-phase), deposited by magnetron sputtering on different substrates (steel, silicon, and silicon dioxide), have been studied. In all cases, very highly preferred (001) orientation was observed in X-ray diffraction measurements. All diffraction data revealed two weak reflections corresponding to d-spacing of 0.5272 and 0.1777 nm. The presence of the two peaks, attributed to (001) and (003) reflections, indicates that β-Ta films exhibit a high preference for the space group of P-42 1 m over P4 2 /mnm, previously proposed for β-Ta. Differences in relative intensities of (00 l) reflections, calculated for single crystal β-Ta σ-type Frank–Kasper structure and those measured in the films, are attributed to defects in the films. Molecular dynamics simulations performed on tantalum clusters with six different initial configurations using the embedded-atom-method potential revealed the stability of β-Ta, which might explain its growth on many substrates under various deposition conditions.