Details

Autor(en) / Beteiligte

• Park, Sunggook
• Schift, Helmut
• Padeste, Celestino
• Schnyder, Bernhard
• Kötz, Rüdiger
• Gobrecht, Jens

Titel

Anti-adhesive layers on nickel stamps for nanoimprint lithography

Ist Teil von

• Microelectronic engineering, 2004-06, Vol.73, p.196-201

Ort / Verlag

Elsevier B.V

Erscheinungsjahr

2004

Link zum Volltext

Quelle

Elsevier ScienceDirect Journals Complete

Beschreibungen/Notizen

• A new route to use silane chemistry as a means of improving anti-sticking properties of Ni stamps for nanoimprint lithography was developed. The surfaces and the corresponding anti-sticking properties for the coatings of a fluorinated silane on three different oxidized surfaces on Ni, namely oxidized Ni, oxidized Ti on Ni, and SiO 2 on Ni, were investigated using atomic/lateral force microscopy, contact angle measurement, X-ray photoelectron spectroscopy, and imprint tests. The surface energies and the friction constants for the silane coatings are found to be in the order NiO/Ni > TiO 2/Ni > SiO 2/Ni, indicating that an introduction of a SiO 2 interlayer is most effective to achieve a better anti-adhesive coating. This is also supported by simultaneous imprint tests with sinusoidal gratings of different coatings, where no failure appears for the coating with a SiO 2 interlayer.