Details

Autor(en) / Beteiligte

• Hakim, L. F.
• Blackson, J.
• George, S. M.
• Weimer, A. W.

Titel

Nanocoating Individual Silica Nanoparticles by Atomic Layer Deposition in a Fluidized Bed Reactor

Ist Teil von

• Chemical vapor deposition, 2005-10, Vol.11 (10), p.420-425

Ort / Verlag

Weinheim: WILEY-VCH Verlag

Erscheinungsjahr

2005

Quelle

Wiley Online Library Journals Frontfile Complete

Beschreibungen/Notizen

• Silica nanoparticles (40 nm) were individually and conformally coated with alumina films using atomic layer deposition (ALD) in a fluidized bed reactor. Films were deposited using self‐limiting sequential surface reactions of trimethylaluminum and water. Alumina vibrational modes were observed using Fourier‐transform infrared spectroscopy (FTIR). X‐ray photoelectron spectroscopy (XPS) indicated complete coverage on the surface as the silica features were completely attenuated. Scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS) showed high uniformity of the deposited films. Transmission electron microscopy (TEM) revealed extremely conformal films with an average growth rate of 0.11 nm per cycle. Self‐limiting characteristics of ALD allowed primary nanoparticles to be coated as they fluidized as dynamic aggregates. Silica nanoparticles (40 nm) can be individually and conformally coated with alumina films using ALD in a fluidized bed reactor. Films are deposited using self‐limiting sequential surface reactions of trimethylaluminum and water. XPS indicated complete coverage on the surface as the silica features were completely attenuated. Extremely conformal, highly uniform film deposition with an average growth rate of 0.11 nm/cycle has been confirmed by SEM, EDS and TEM studies. The self‐limiting characteristics of ALD allow the primary nanoparticles to be coated as they fluidize as dynamic aggregates.