Details

Autor(en) / Beteiligte

• KOO, JUNE-MO
• KIM, SUKPIL
• SHIN, SANGMIN
• LEE, KWANGHEE
• LEE, JANGHO
• KIM, KIHONG
• SEO, BUM-SEOK
• LEE, JUNG HYUN
• PARK, YOUNGSOO

Titel

CHARACTERIZATION OF NOVEL ELECTRODE FOR HIGH-DENSITY Pb(Zr, Ti)O3 CAPACITOR APPLICATION

Ist Teil von

• Integrated ferroelectrics, 2006-11, Vol.81 (1), p.15-26

Ort / Verlag

Taylor & Francis Group

Erscheinungsjahr

2006

Link zum Volltext

Quelle

Taylor & Francis

Beschreibungen/Notizen

• For high-density FRAM application, we found novel electrodes of IrTi family having a sufficiently low resistance. In addition, IrTi show good adhesion and better surface roughness than Ir. From FWHM results, PZT crystallinity is improved by applying IrTi. IrTi enhanced PZT capacitor properties of Fatigue and Retention. In 60 nm PZT, IrTi and IrTiOx/IrTi bottom electrode were effected increasing remnant polarization of 37 uC/cm 2 and 47 uC/cm 2 at 1.8 V. We successfully adopted IrTi family bottom electrode for making ultra thin PZT:40 nm PZT have good electric results such as [2Pr = 37 μ C/cm 2 , at 2 V]. Results of 40 nm PZT using IrTiOx/IrTi electrode is possibly given a challengeable clue for high-density FRAM.