Details

Autor(en) / Beteiligte

• Tsuchiya, T.
• Daoudi, K.
• Yamaguchi, I.
• Manabe, T.
• Kumagai, T.
• Mizuta, S.

Titel

Preparation of tin oxide films on various substrates by excimer laser metal organic deposition

Ist Teil von

• Applied surface science, 2005-07, Vol.247 (1), p.145-150

Ort / Verlag

Amsterdam: Elsevier B.V

Erscheinungsjahr

2005

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• Tin oxide (SnO 2) thin films were prepared on various substrates by the excimer laser metal organic deposition (ELMOD) and the thermal metal organic deposition (MOD) processes. When the amorphous SnO 2 film prepared at 300 °C on (1 0 0) Si, and (1 0 1 0) sapphire substrates was irradiated by the KrF excimer laser at a fluence of 200 mJ/cm 2 and 25 °C, polycrystalline SnO 2 films were obtained. When the amorphous SnO 2 film prepared at 300 °C on the (1 0 0) SrTiO 3 and (1 0 0) TiO 2 substrates was irradiated by the KrF excimer laser at the same conditions, a (1 1 0) oriented SnO 2 film on the SrTiO 3 substrate and a (1 0 0) oriented SnO 2 film on the TiO 2 substrate were obtained. Using the pole–figure measurements, a SnO 2 film on TiO 2 substrate was found to be epitaxially grown. On the other hand, when a thermal MOD process was used, all the product films on their substrates were of the polycrystalline phase whereas the orientation of the films depended on the substrate. Polycrystalline and epitaxial growth of the SnO 2 films by the ELMOD process are also discussed.