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Segregation of silicon was induced by light-ion irradiation at elevated temperatures in Ni-8Si specimens. Its occurrence at external surfaces, helium-induced cavities, dislocation loops, coherent twin boundaries, grain boundaries, and precipitate-matrix interfaces has been investigated by transmission electron microscopy. Layers of ordered γ
′
(Ni
3
Si) phase were formed at most of these point defect sinks. The behaviour of grain boundary precipitation was found to be exceptional in various respects. In particular, a high rate of precipitation distinguishes grain boundaries from all other kinds of point defect sinks investigated here. This phenomenon of rapid precipitation was found to be adjoined to precipitation-driven grain boundary migration and is attributed to a radiation-induced "discontinuous" precipitate reaction. Observations of helium bubble distributions created during α-particle irradiations at growing dislocation loops and at migrating grain boundaries are also briefly discussed.