Details

Autor(en) / Beteiligte

• Yang, Jeehye
• Lee, Myeongjae
• Park, Se Young
• Park, Myoungjin
• Kim, Jonghoon
• Sitapure, Niranjan
• Hahm, Donghyo
• Rhee, Seunghyun
• Lee, Daeyeon
• Jo, Hyunwoo
• Jo, Yong Hyun
• Lim, Jaemin
• Kim, Jungwook
• Shin, Tae Joo
• Lee, Doh C.
• Kwak, Kyungwon
• Kwon, Joseph S.
• Kim, BongSoo
• Bae, Wan Ki
• Kang, Moon Sung

Titel

Nondestructive Photopatterning of Heavy‐Metal‐Free Quantum Dots

Ist Teil von

• Advanced materials (Weinheim), 2022-10, Vol.34 (43), p.e2205504-n/a

Ort / Verlag

Weinheim: Wiley Subscription Services, Inc

Erscheinungsjahr

2022

Quelle

Wiley Online Library All Journals

Beschreibungen/Notizen

• Electroluminescence from quantum dots (QDs) is a suitable photon source for futuristic displays offering hyper‐realistic images with free‐form factors. Accordingly, a nondestructive and scalable process capable of rendering multicolored QD patterns on a scale of several micrometers needs to be established. Here, nondestructive direct photopatterning for heavy‐metal‐free QDs is reported using branched light‐driven ligand crosslinkers (LiXers) containing multiple azide units. The branched LiXers effectively interlock QD films via photo‐crosslinking native aliphatic QD surface ligands without compromising the intrinsic optoelectronic properties of QDs. Using branched LiXers with six sterically engineered azide units, RGB QD patterns are achieved on the micrometer scale. The photo‐crosslinking process does not affect the photoluminescence and electroluminescence characteristics of QDs and extends the device lifetime. This nondestructive method can be readily adapted to industrial processes and make an immediate impact on display technologies, as it uses widely available photolithography facilities and high‐quality heavy‐metal‐free QDs with aliphatic ligands. Nondestructive direct photopatterning for heavy‐metal‐free quantum dots is presented by using branched light‐driven ligand crosslinkers containing multiple azide units. The branched crosslinkers effectively interlock quantum dot films without compromising the intrinsic photoluminescence and electroluminescence properties of quantum dots. This nondestructive method can be directly adapted to photolithography facilities widely available in industry.