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Compound Bragg reflection filters made by spatial frequency doubling lithography
Ist Teil von
Journal of lightwave technology, 1989-09, Vol.7 (9), p.1379-1385, Article 1379
Ort / Verlag
New York, NY: IEEE
Erscheinungsjahr
1989
Quelle
IEL
Beschreibungen/Notizen
A report is presented on the fabrication of complex Bragg filters with resonant wavelengths near 1.55 mu m, patterned by photolithography using a high-resolution deep ultraviolet stepper. The projection of gratings with quarter-micrometer features was made possible by the use of spatial frequency-doubling lithography. A single chip, processed entirely in the silicon facility, was used to demonstrate five Bragg reflectors of different wavelengths, a quarter-wave shifted resonator, broadband stacked filters with as many as 15 uniform Bragg reflector sections of different Bragg wavelengths, and broadband stacked filters containing a passband within the reflection band. The filters exhibited nearly ideal spectral behavior.< >