Journal of lightwave technology, 1989-09, Vol.7 (9), p.1379-1385, Article 1379
1989
Volltextzugriff (PDF)
Details
- Autor(en) / Beteiligte
- Titel
- Compound Bragg reflection filters made by spatial frequency doubling lithography
- Ist Teil von
- Journal of lightwave technology, 1989-09, Vol.7 (9), p.1379-1385, Article 1379
- Ort / Verlag
- New York, NY: IEEE
- Erscheinungsjahr
- 1989
- Quelle
- IEL
- Beschreibungen/Notizen
- A report is presented on the fabrication of complex Bragg filters with resonant wavelengths near 1.55 mu m, patterned by photolithography using a high-resolution deep ultraviolet stepper. The projection of gratings with quarter-micrometer features was made possible by the use of spatial frequency-doubling lithography. A single chip, processed entirely in the silicon facility, was used to demonstrate five Bragg reflectors of different wavelengths, a quarter-wave shifted resonator, broadband stacked filters with as many as 15 uniform Bragg reflector sections of different Bragg wavelengths, and broadband stacked filters containing a passband within the reflection band. The filters exhibited nearly ideal spectral behavior.< >
- Sprache
- Englisch
- Identifikatoren
- ISSN: 0733-8724eISSN: 1558-2213DOI: 10.1109/50.50717Titel-ID: cdi_proquest_miscellaneous_25150403
- Format
- –
- Schlagworte
- Applied sciences, Band pass filters, Circuit properties, Electric, optical and optoelectronic circuits, Electronics, Exact sciences and technology, Fabrication, Frequency, Gratings, Integrated optics. Optical fibers and wave guides, Lithography, Optical and optoelectronic circuits, Passband, Reflection, Resonance, Resonator filters, Silicon