Details

Autor(en) / Beteiligte

• Schalch, Dirk
• Scharmann, Arthur
• Weiß, Albrecht

Titel

Characterization of reactively sputtered BeO films

Ist Teil von

• Thin solid films, 1985-01, Vol.124 (3), p.351-358

Ort / Verlag

Elsevier B.V

Erscheinungsjahr

1985

Link zum Volltext

Quelle

Elsevier Journal Backfiles on ScienceDirect (DFG Nationallizenzen)

Beschreibungen/Notizen

• Amorphous BeO films were deposited by reactive r.f. sputtering from metallic beryllium. The electrical, optical and structural properties of these films were investigated using Auger electron spectroscopy, particle-induced X-ray emission and optical and IR transmission spectroscopy and by measurements of the refractive index and the electrical conductivity, including the electron-irradiation-induced conductivity. The sputtered films are of high quality, with regard to purity, homogeneity, adherence and stability towards thermal treatment. The refractive index of stoichiometric films was determined to about 1.71, and the electrical resistivity to about 10 16ωcm in the electric field range 10 7−10 8 V m −1. The mobility-lifetime product of the charge carriers was estimated to be of the order of 10 −13 cm 2 V −1.