Sie befinden Sich nicht im Netzwerk der Universität Paderborn. Der Zugriff auf elektronische Ressourcen ist gegebenenfalls nur via VPN oder Shibboleth (DFN-AAI) möglich. mehr Informationen...
Sequential Oxidation and C−H Bond Activation at a Gallium(I) Center
Ist Teil von
Angewandte Chemie International Edition, 2019-12, Vol.58 (50), p.18102-18107
Auflage
International ed. in English
Ort / Verlag
Germany: Wiley Subscription Services, Inc
Erscheinungsjahr
2019
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
In situ oxidation of the GaI compound NacNacGa by either N2O or pyridine oxide results in the generation of a labile monomeric oxide, NacNacGa(O), which can easily cleave the C−H bonds of aliphatic and aromatic substrates featuring good donor sites. The products of this reaction are gallium organyl hydroxides. DFT calculations show that these reactions start with the formation of NacNac‐Ga(O)(L) adducts, the oxo ligand of which can easily protons from nearby C−H bonds, even for sp2‐hybridized carbon centers. Aliphatic amines do not enter this reaction for kinetic reasons, presumably because of the unfavorable sterics.
NacNac! Who′s there? In situ oxidation of the GaI compound 1 results in the transient monomeric oxo derivative NacNacGa=O, which adds to C−H bonds of a variety of substrates featuring hard donor sites. Density‐functional calculations are also presented.