Details

Autor(en) / Beteiligte

• Schroeder, Uwe
• Richter, Claudia
• Park, Min Hyuk
• Schenk, Tony
• Pešić, Milan
• Hoffmann, Michael
• Fengler, Franz P. G
• Pohl, Darius
• Rellinghaus, Bernd
• Zhou, Chuanzhen
• Chung, Ching-Chang
• Jones, Jacob L
• Mikolajick, Thomas

Titel

Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material

Ist Teil von

• Inorganic chemistry, 2018-03, Vol.57 (5), p.2752-2765

Ort / Verlag

United States: American Chemical Society

Erscheinungsjahr

2018

Link zum Volltext

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• Recently simulation groups have reported the lanthanide series elements as the dopants that have the strongest effect on the stabilization of the ferroelectric non-centrosymmetric orthorhombic phase in hafnium oxide. This finding confirms experimental results for lanthanum and gadolinium showing the highest remanent polarization values of all hafnia-based ferroelectric films until now. However, no comprehensive overview that links structural properties to the electrical performance of the films in detail is available for lanthanide-doped hafnia. La:HfO2 appears to be a material with a broad window of process parameters, and accordingly, by optimization of the La content in the layer, it is possible to improve the performance of the material significantly. Variations of the La concentration leads to changes in the crystallographic structure in the bulk of the films and at the interfaces to the electrode materials, which impacts the spontaneous polarization, internal bias fields, and with this the field cycling behavior of the capacitor structure. Characterization results are compared to other dopants like Si, Al, and Gd to validate the advantages of the material in applications such as semiconductor memory devices.