Details

Autor(en) / Beteiligte

• Ma, Quansheng
• Li, Liuhe
• Xu, Ye
• Gu, Jiabin
• Wang, Lei
• Xu, Yi

Titel

Effect of bias voltage on TiAlSiN nanocomposite coatings deposited by HiPIMS

Ist Teil von

• Applied surface science, 2017-01, Vol.392, p.826-833

Ort / Verlag

Elsevier B.V

Erscheinungsjahr

2017

Link zum Volltext

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• •HiPIMS-deposited TiAlSiN coatings show obvious improvements compared with DCMS.•The effects of bias voltage on coatings properties have evident regularity.•A coating with high hardness, low roughness and small grain size was attained.•An increasing plasma discharge current was detected with increasing the bias voltage. TiAlSiN nanocomposite coatings were deposited onto cemented carbide (WC-10wt.%, Co) substrates by high power impulse magnetron sputtering (HiPIMS). The effect of substrate bias voltage on plasma discharge characterization of HiPIMS, element concentration, deposition rate, microstructure, surface/cross-sectional morphology, hardness and adhesion strength of coatings were studied. Compared with those deposited with direct current magnetic sputtering (DCMS), HiPIMS-deposited TiAlSiN coatings show improvements in some properties, including the surface roughness, the grain size, the hardness and adhesion strength, but a decrease in the deposition rate. When the bias voltage increases, the discharge current rose up from 118A to 165A. HiPIMS-deposited TiAlSiN coatings show a shift of the preferred crystallographic orientation from (220) to (200) and decreases in surface roughness from 14.1nm down to 7.4nm and grain size from 10.5nm to 7.4nm. Meanwhile, a change in crystal morphology from columnar to equiaxial and a grain refinement, as well as an increase of hardness from 30GPa up to 42GPa of those TiAlSiN coatings were observed with the increasing bias voltage and a decrease in adhesion strength from HF2 to HF5 of those coatings were revealed by indentation adhesion test.