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Charge storage characteristics of Ni nanocrystals formed by synchronous crystallization
Ist Teil von
Journal of semiconductors, 2014-10, Vol.35 (10), p.17-22
Erscheinungsjahr
2014
Link zum Volltext
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
The rapid thermal annealing （RTA） nano-crystallization method is widely used in the metal nanocrystal fabrication process. However, the high temperature （usually 600 900 ℃） in the RTA process will worsen the per- formance and reliability of devices. A novel method has been proposed to grow metal nanocrystal by synchronous in situ nano-crystallization of metal thin film （SINC）, which is able to resolve the problems mentioned above. Com- pared with Ni nanocrystals （NCs） formed by RTA, Ni NCs prepared by SINC can obtain more energy to crystallize, and its crystallization temperature is greatly reduced. A large memory window （2.78 V） was observed for Ni NCs deposited by SINC at 300 ℃. However, the largest window is only 1.26 V for Ni NCs formed by RTA at 600 ℃. A large change （from 0.20 to 4.59 V） of the memory window was observed while the operation voltage increased from 0 to 4-10 V, which is due to an occurrence of strong carrier trapping in Ni NCs. Flat-band voltage shift rapidly increases to its saturation value, which indicates that electron/hole trapping in Ni NCs mainly occurs at the initial stage of the program/erase process. A theoretical model was proposed to characterize the charging and discharging processes.