Details

Autor(en) / Beteiligte

• Durina, P
• Bencurova, A
• Konecnikova, A
• Kostic, I
• Vutova, K
• Koleva, E
• Mladenov, G
• Kus, P
• Plecenik, A

Titel

Patterning of structures by e-beam lithography and ion etching for gas sensor applications

Ist Teil von

• Journal of physics. Conference series, 2014-01, Vol.514 (1), p.12037-5

Ort / Verlag

Bristol: IOP Publishing

Erscheinungsjahr

2014

Quelle

EZB Electronic Journals Library

Beschreibungen/Notizen

• This work deals with a method of preparation of nanometer structures for a gas detector based on e-beam lithography and ion etching of a thin TiO2 film. The aim was the fabrication of a gas sensor with meander or comb structures of nanometer dimensions. This is of importance since both the size of the contacts and the layer thickness affect the sensor's sensitivity.