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► The influence of post-annealing conditions on the properties of p-type ZnO:(Ag,N) films was investigated. ► Transition from n-type to p-type conduction occurred at the annealing temperature of 400°C. ► The hole concentration first increases and then decreases with increasing annealing temperature. The optimum annealing temperature is about 500°C. ► The ZnO:(Ag,N) films exhibit a strong ultraviolet emission after annealing in O2.
Ag–N dual-doped p-type ZnO (ZnO:(Ag,N)) thin films have been prepared using the sol–gel method. The modifications of the structural, electrical and optical properties of ZnO:(Ag,N) films after annealing in various atmosphere in the temperature range of 300–600°C are discussed. Results show the oxygen-rich environment is benefit to the p-type samples. Transition from n-type to p-type conduction occurred at the annealing temperature of 400°C. The optimum annealing temperature is about 500°C.