Sie befinden Sich nicht im Netzwerk der Universität Paderborn. Der Zugriff auf elektronische Ressourcen ist gegebenenfalls nur via VPN oder Shibboleth (DFN-AAI) möglich. mehr Informationen...
Ergebnis 12 von 213

Details

Autor(en) / Beteiligte
Titel
Annealing effects on the composition and disorder of Ga(N,As,P) quantum wells on silicon substrates for laser application
Ist Teil von
  • Journal of crystal growth, 2014-09, Vol.402, p.169-174
Ort / Verlag
Amsterdam: Elsevier B.V
Erscheinungsjahr
2014
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
  • The influence of a rapid thermal annealing procedure on the properties of Ga(N,As,P) multiple quantum wells grown on silicon substrates has been studied. We reveal the changes in composition and disorder on the basis of photoluminescence, photoluminescence excitation and Raman spectroscopy as well as transmission electron microscopy. The optimal annealing temperature was found to be in the range of 900–925°C. By increasing the annealing temperature (Ta) from 850°C to 1000°C, we found a gradual exchange of arsenic and phosphorous atoms between the quantum wells and the barriers. At highest annealing temperatures our results are consistent with a reduction of the As concentration by several percent. •Ga(N,As,P) MQWs on silicon substrates have been studied by optical spectroscopy.•Changes in composition of the quaternary quantum wells have been found.•Exchange of arsenic and phosphorous atoms has been revealed.•The optimal annealing temperature for laser application was determined.

Weiterführende Literatur

Empfehlungen zum selben Thema automatisch vorgeschlagen von bX