Thin solid films, 2010-05, Vol.518 (15), p.4087-4090
2010
Details
- Autor(en) / Beteiligte
- Titel
- A structure zone diagram including plasma-based deposition and ion etching
- Ist Teil von
- Thin solid films, 2010-05, Vol.518 (15), p.4087-4090
- Ort / Verlag
- Amsterdam: Elsevier B.V
- Erscheinungsjahr
- 2010
- Link zum Volltext
- Quelle
- Alma/SFX Local Collection
- Beschreibungen/Notizen
- An extended structure zone diagram is proposed that includes energetic deposition, characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high power impulse magnetron sputtering. The axes are comprised of a generalized homologous temperature, the normalized kinetic energy flux, and the net film thickness, which can be negative due to ion etching. It is stressed that the number of primary physical parameters affecting growth by far exceeds the number of available axes in such a diagram and therefore it can only provide an approximate and simplified illustration of the growth condition–structure relationships.
- Sprache
- Englisch
- Identifikatoren
- ISSN: 0040-6090eISSN: 1879-2731DOI: 10.1016/j.tsf.2009.10.145Titel-ID: cdi_proquest_miscellaneous_1671237572
- Format
- –
- Schlagworte
- Approximation, Cross-disciplinary physics: materials science, rheology, Deposition, Deposition by sputtering, Etching and cleaning, Exact sciences and technology, Film thickness, Flux, Homologous temperature, Illustrations, Ion and electron beam-assisted deposition, ion plating, Ion etching, Kinetic energy, Materials science, Methods of deposition of films and coatings, film growth and epitaxy, Morphology, Physics, Physics of gases, plasmas and electric discharges, Physics of plasmas and electric discharges, Plasma applications, Plasma assistance, Plasma-based ion implantation and deposition, Potential and kinetic energy, Stress, Structure zone diagram, Thin film deposition, Thin films