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Growth and characterizations of dual ion beam sputtered CIGS thin films for photovoltaic applications
Ist Teil von
Journal of materials science. Materials in electronics, 2014-07, Vol.25 (7), p.3069-3076
Ort / Verlag
Boston: Springer US
Erscheinungsjahr
2014
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
The growth of CIGS thin films on soda-lime glass substrates at different substrate temperatures by dual ion beam sputtering system in a single-step route from a single quaternary sputtering target with the composition of Cu (In
0.70
Ga
0.30
) Se
2
was reported. The effects of the substrate temperature on structural, optical, morphological and electrical properties of CIGS films were investigated. Stoichiometry of one such film was investigated by X-ray photoelectron spectroscopy. All CIGS films had demonstrated a strong (112) orientation located at 2θ ~26.70
o
, which indicated the chalcopyrite structure of films. The value of full-width at half-maximum of (112) peak was reduced from 0.58° to 0.19° and crystallite size was enlarged from 14.98 to 43.05 nm as growth temperature was increased from 100 to 400 °C. However, atomic force microscope results showed a smooth and uniform surface at lower growth temperature and the surface roughness was observed to increase with increasing growth temperature. Hall measurements exhibited the minimum film resistivity of 0.09 Ω cm with a hole concentration of 2.42 × 10
18
cm
−3
and mobility of 28.60 cm
2
V
−1
s
−1
for CIGS film grown at 100 °C. Film absorption coefficient was found to enhance nominally from 1 × 10
5
to 2.3 × 10
5
cm
−1
with increasing growth temperature from 100 to 400 °C.