Details

Autor(en) / Beteiligte

• Tommila, J.
• Polojärvi, V.
• Aho, A.
• Tukiainen, A.
• Viheriälä, J.
• Salmi, J.
• Schramm, A.
• Kontio, J.M.
• Turtiainen, A.
• Niemi, T.
• Guina, M.

Titel

Nanostructured broadband antireflection coatings on AlInP fabricated by nanoimprint lithography

Ist Teil von

• Solar energy materials and solar cells, 2010-10, Vol.94 (10), p.1845-1848

Ort / Verlag

Amsterdam: Elsevier B.V

Erscheinungsjahr

2010

Link zum Volltext

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• We report the fabrication of moth-eye antireflection nanostructures on AlInP compound commonly used as a window layer in high-efficiency multijunction solar cells. The broadband antireflective nanostructures were fabricated by nanoimprint lithography directly on molecular beam epitaxy grown AlInP/GaAs surface. At normal incidence, the structures exhibited an average reflectivity of 2.7% measured in a spectral range 450–1650 nm. Photoluminescence measurements of the emission from GaAs substrate suggest that the optical losses associated with the moth-eye pattern are low. Nanoimprint lithography offers a cost-effective approach to fabricate broadband antireflection coatings required in III–V high-efficiency multijunction solar cells.