IEEE photonics technology letters, 2005-12, Vol.17 (12), p.2613-2615
2005
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Details
- Autor(en) / Beteiligte
- Titel
- Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography
- Ist Teil von
- IEEE photonics technology letters, 2005-12, Vol.17 (12), p.2613-2615
- Ort / Verlag
- New York: IEEE
- Erscheinungsjahr
- 2005
- Quelle
- IEEE Xplore
- Beschreibungen/Notizen
- We present a silicon-on-insulator (SOI) waveguide to fiber coupler fabricated using 248-nm-deep ultraviolet lithography. The loss of the taper structure is around 1 dB while the coupling loss from a lensed fiber into a 590-nm-wide SOI waveguide was measured to be 1.9 dB.
- Sprache
- Englisch
- Identifikatoren
- ISSN: 1041-1135eISSN: 1941-0174DOI: 10.1109/LPT.2005.859132Titel-ID: cdi_proquest_journals_869092823
- Format
- –
- Schlagworte
- CMOS technology, Dubnium, Fibers, Integrated optics, Joining, Lithography, Noise levels, Optical devices, Optical fiber couplers, Optical fiber polarization, Optical fibers, Optical losses, Optical waveguides, Photonics, Polymers, Silicon on insulator technology, Ultraviolet, Waveguides