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Details

Autor(en) / Beteiligte
Titel
Continuous regulation of Cu electronic states by rectifying Schottky contacts enhancing electrochemical nitrate reduction to ammonia
Ist Teil von
  • Inorganic chemistry frontiers, 2024, Vol.11 (12), p.353-351
Ort / Verlag
London: Royal Society of Chemistry
Erscheinungsjahr
2024
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
  • Electrochemical conversion of nitrate (NO 3 − ) to ammonia (NH 3 ) appears to be a carbon-neutral method to handle wastewater remediation, while providing an innovative pathway for high-value green ammonia synthesis. However, designing highly efficient electrochemical catalysts remains one of the primary challenges in fulfilling this strategy. Herein, we constructed a series of Cu@N x C metal-carbon Mott-Schottky heterostructures composed of Cu nanoparticles uniformly dispersed on tailorable N-doped carbon substrates. The broad range of the content of the N dopant greatly enables adjusting the band gap of the carbon. The increased N content leads to a higher degree of interfacial charge separation. The optimal heterostructured Cu@N 1.0 C electrocatalyst presents a FE NH 3 of 96.2% at −0.9 V vs. RHE and a remarkable NH 3 yield of 1353.1 mmol h −1 g cat −1 at −1.1 V vs. RHE, superior to those of the reference Cu@C and most of the reported NO 3 RR catalysts. The mechanism investigation demonstrates that rectifying Schottky contacts in the Cu@N x C heterostructures reduces the electron density of the Cu sites and further improves the Cu + concentration, thus promoting the adsorption and activation of NO 3 − . This study offers a new possibility for improving the NO 3 RR performance of electrocatalysts by the rectification strategy. Metal-carbon heterostructured Cu@N x C catalysts with precise regulation of the N content are constructed. The optimized Cu@N 1.0 C electrocatalyst converts NO 3 − to NH 3 with a high FE NH 3 of 96.2% at −0.9 V vs. RHE, and NH 3 yield rate is 1353.1 mmol h −1 g cat −1 at −1.1 V vs. RHE.
Sprache
Englisch
Identifikatoren
ISSN: 2052-1553, 2052-1545
eISSN: 2052-1553
DOI: 10.1039/d4qi00614c
Titel-ID: cdi_proquest_journals_3066229548

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