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Influence of different particle injection methods on plasma sheath with strong production of negative ion in one-dimensional PIC simulation
Ist Teil von
Journal of instrumentation, 2024-01, Vol.19 (1), p.C01032
Ort / Verlag
Bristol: IOP Publishing
Erscheinungsjahr
2024
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
Abstract
Particle injection is necessary to maintain the plasma source term in particle-in-cell
(PIC) simulation. There are two commonly used particle injection methods, namely, a) constant flux
injection, in which a fixed number of ion-electron pairs are injected each time step, and b) pair
re-injection, in which the number of ion-electron pairs injected is according to the number of
positive ions removed. Different injection methods may bring big difference to the simulation
results. Therefore, the appropriate particle injection method must be selected according to the
object and purpose of simulation to obtain the correct result. In this paper, a 1D3V (one
dimension in space and three dimensions in velocity space) PIC model is used to analyze the
evolution of plasma in the formation of space charge limited (SCL) sheath and reverse sheath with
the condition of surface production, and the differences of the two particle injection methods are
compared. It is found that the simulation result with pair re-injection does not match experiment
result.