Details

Autor(en) / Beteiligte

• Ke, Yi-En
• Chen, Yung-I

Titel

Mechanical properties, bonding characteristics, and thermal stability of magnetron-sputtered HfNx films

Ist Teil von

• Surface & coatings technology, 2020-04, Vol.388, p.1-6, Article 125575

Ort / Verlag

Lausanne: Elsevier B.V

Erscheinungsjahr

2020

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• HfNx (x = 0.81–2.07) films were fabricated through direct current magnetron sputtering by varying nitrogen flow ratio [N2/(Ar + N2)] from 0.1 to 1.0. The structural evolution, mechanical properties, and bonding characteristics of the as-deposited HfNx films were investigated for various values of the stoichiometric variable x. The results indicated that the films prepared using nitrogen flow ratios lower than 0.2 and higher than 0.4 exhibited crystalline and near-amorphous structures, respectively. The highest level of the nanoindentation hardness of the near-stoichiometric Hf51N49 films prepared using a nitrogen flow ratio of 0.2 was 26.0 GPa. Further increases to the x value of HfNx films decreased the hardness levels, which could be attributed to higher Hf3N4 content. The bonding constitutions comprised metallic Hf, HfN bonds of HfN and Hf3N4, and HfO bonds. The amounts of HfN bonds in Hf3N4 structure increased as x increased. The thermal stability values of the HfNx films at 500 and 600 °C in a 15-ppm O2–N2 atmosphere were evaluated. •Bonding constitution varied from HfN to Hf3N4 dominant with increasing the N content.•The near-stoichiometric HfNx films exhibited the highest hardness in this study.•Hf3N4 films exhibited an inferior thermal stability related to HfN films.