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Lateral Inhomogeneities of Sapphire Plates Determined with the Aid of X-Ray and Probe Methods
Ist Teil von
Technical physics, 2020-03, Vol.65 (3), p.400-406
Ort / Verlag
Moscow: Pleiades Publishing
Erscheinungsjahr
2020
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
X-ray diffractometry, X-ray profilometry, atomic-force microscopy, and sclerometer tests are employed in the study of
R
-cut plates of sapphire single crystals grown with the aid of the Kyropoulos technique and used as substrates for the silicon-on-sapphire structures. Regions with different degrees of perfection can be found even on a single plate. Mutually consistent results of the four experimental methods based on different physical principles can be used to reveal regions of structural imperfection on the surface of a plate. It is expedient to employ a complex procedure for multipoint monitoring of the parameters of plates to reduce the number of defect samples that serve as substrates in the production of electronic devices.