Details

Autor(en) / Beteiligte

• Gordillo, N.
• Gómez de Castro, C.
• Tejado, E.
• Pastor, J.Y.
• Balabanian, G.
• Panizo-Laiz, M.
• Gonzalez-Arrabal, R.
• Perlado, J.M.
• del Rio, J.

Titel

On the thermal stability of the nanostructured tungsten coatings

Ist Teil von

• Surface & coatings technology, 2017-09, Vol.325, p.588-593

Ort / Verlag

Lausanne: Elsevier B.V

Erscheinungsjahr

2017

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• Tungsten is a candidate to be used as plasma facing materials in future fusion nuclear reactors. There, the material has to withstand large radiation fluxes and thermal loads. Nowadays, nanostructured tungsten (NW) seems to exhibit a better radiation-resistance than the coarse grained. However, the thermal stability of NW is still an open question. On these bases, the thermal stability of NW coatings is studied in the temperature range from 1000 to 1473K. For this purpose, Samples were isothermally annealed in vacuum at temperatures from 298 to 1473K. The morphological and microstructural properties of the samples were characterized by atomic force microscopy (AFM), scanning electron microscopy (SEM) and X-Ray diffraction (XRD), respectively. For T<1000K nanostructured are preserved and only a small reduction in the internal stress of the films is observed. For T>100K, nanostructures start to grow in a bimodal fashion with activation energy of 0.259eV, reaching a submicron-sized threshold at T≈1473K. •In situ thermodiffraction was used to study the stability of nanostructured tungsten.•The diffractograms were measured from RT up to 1473K.•No grain growth is observed for temperatures lower than 1000K.•The recrystallization develops into a bimodal grain distribution for temperatures higher than 1000K.