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A novel patterning method for perovskite thin films is developed by Dae‐Hyeong Kim and co‐workers, which is described in article number 1702902. The patterning method (spin‐on‐patterning) is based on the thermodynamically preferred dewetting behavior of the perovskite precursor solution during the spin‐coating process. By using this method, a high‐performance, ultrathin, and deformable perovskite‐on‐silicon multiplexed image sensor array is successfully achieved.