Details

Autor(en) / Beteiligte

• Chen, Yuanpeng
• Liang, Hongwei
• Xia, Xiaochuan
• Zhang, Heqiu
• Shi, Jianjun
• Abbas, Qasim
• Du, Guotong

Titel

Growth temperature impact on film quality of hBN grown on Al2O3 using non-catalyzed borazane CVD

Ist Teil von

• Journal of materials science. Materials in electronics, 2017-10, Vol.28 (19), p.14341-14347

Ort / Verlag

New York: Springer US

Erscheinungsjahr

2017

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• Hexagonal boron nitride (hBN) films were directly grown on c-plane Al 2 O 3 substrates by low pressure thermal chemical vapor deposition (CVD) with single precursor i.e. borazane (NH 3 -BH 3 ) without employing any extra catalysis. The growth temperature influence on the growth and properties of BN films were investigated. It was found that with a suitable source supply rate, the growth temperature could obviously influence the growth rate, chemical state, crystal structure and optical properties of BN films. High growth temperature depicts low thickness film grown, even there was no BN film deposited when the temperature was higher than or equal to 1400 °C. The B–N bonding type in all the deposited BN films were conformed as sp 2 bonding, and films were evidenced to be amorphous BN (aBN) at lower growth temperature (i.e. less than 1350 °C) and hBN in turbostratic phase (tBN) between 1350 and 1400 °C. All the grown BN films on sapphire substrate showed good ultraviolet (UV) absorption edge near 210 nm, according to transmittance spectra. This work presents a feasible route towards combination of large-scale CVD-grown hBN film with traditional III-N compounds for applications in deep UV optoelectronic devices.