Details

Autor(en) / Beteiligte

• Marinkovic, Marko
• Takata, Ryo
• Neumann, Anita
• Pham, Duy Vu
• Anselmann, Ralf
• Maas, Joris
• van der Steen, Jan-Laurens
• Gelinck, Gerwin
• Katsouras, Ilias

Titel

14‐1: Large‐Area Processing of Solution Type Metal‐Oxide in TFT Backplanes and Integration in Highly Stable OLED Displays

Ist Teil von

• SID International Symposium Digest of technical papers, 2017-05, Vol.48 (1), p.169-172

Ort / Verlag

Campbell: Wiley Subscription Services, Inc

Erscheinungsjahr

2017

Quelle

Wiley Online Library

Beschreibungen/Notizen

• Solution type metal‐oxide semiconductor was processed on mass‐production ready equipment and integrated in a backplane with ESL architecture TFTs. Excellent thickness uniformity of the semiconductor layer was obtained over the complete Gen1 glass substrate (320 mm x 352 mm), resulting in homogeneous TFT performance and bias stress reliability. An 85‐ppi QVGA AMOLED display is demonstrated.