Details

Autor(en) / Beteiligte

• Ngo, C. Y.
• Hong, L. Y.
• Deng, J.
• Khoo, E. H.
• Liu, Z.
• Wu, R. F.
• Teng, J. H.

Titel

Dielectric nanostructures with high laser damage threshold

Ist Teil von

• Applied physics. A, Materials science & processing, 2017-02, Vol.123 (2), p.1-5, Article 115

Ort / Verlag

Berlin/Heidelberg: Springer Berlin Heidelberg

Erscheinungsjahr

2017

Link zum Volltext

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• Dielectric-based metamaterials are proposed to be the ideal candidates for low-loss, high-efficiency devices. However, to employ dielectric nanostructures for high-power applications, the dielectric material must have a high laser-induced damaged threshold (LIDT) value. In this work, we investigated the LIDT values of dielectric nanostructures for high-power fiber laser applications. Consequently, we found that the fabricated SiO 2 nanostructured lens can withstand laser fluence exceeding 100 J/cm 2 .