Details

Autor(en) / Beteiligte

• Conley, Will
• Miller, Daniel
• Chambers, Charles
• C. Trinque, Brian
• Osborn, Brian
• Chiba, Takashi
• Zimmerman, Paul
• Dammel, Ralph
• Romano, Andrew
• Grant Willson, C

Titel

Dissolution Inhibitors for 157nm Lithography

Ist Teil von

• Journal of photopolymer science and technology, 2002-08, Vol.15 (4), p.613

Ort / Verlag

Hiratsuka: Japan Science and Technology Agency

Erscheinungsjahr

2002

Quelle

EZB Free E-Journals

Beschreibungen/Notizen

• Fluorocarbon based polymers have been identified as promising resist candidates for 157nm material design because of their relatively high transparency at this wavelength. This paper reports our recent progress toward developing 157nm resist materials based on transparent dissolution inhibitors. These 2 component resist systems have been prepared and preliminary imaging studies at 157nm are described. Several new approaches to incorporating these transparent monomers into functional polymers have been investigated and are described. The lithographic performance of some of these polymers is discussed.