Details

Autor(en) / Beteiligte

• MacDowell, A. A.
• Bjorkholm, J. E.
• Bokor, J.
• Eichner, L.
• Freeman, R. R.
• Pastalan, J. Z.
• Szeto, L. H.
• Tennant, D. M.
• Wood, O. R.
• Jewell, T. E.
• Mansfield, W. M.
• Waskiewicz, W. K.
• White, D. L.
• Windt, D. L.

Titel

Reduction imaging with soft x rays for projection lithography

Ist Teil von

• Review of Scientific Instruments, 1992-01, Vol.63 (1), p.737-740

Ort / Verlag

Woodbury, NY: American Institute of Physics

Erscheinungsjahr

1992

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• It has been shown that it is possible to produce near diffraction limited images with soft x rays of wavelength 13.8 nm using normal incidence Si/Mo‐multilayered coated optics. Initial experiments with a 20X reduction Schwarzschild optic produced features as small as 50 nm. It is considered that soft x‐ray projection lithography may be a likely candidate for the future generation of lithographic tools needed to produce 0.1‐μm features for integrated circuits around the turn of the century.