Japanese journal of applied physics, 1994, Vol.33 (7B), p.4298-4302
1994
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Details
- Autor(en) / Beteiligte
- Titel
- CF3, CF2 and CF radical measurements in RF CHF3 etching plasma using infrared diode laser absorption spectroscopy
- Ist Teil von
- Japanese journal of applied physics, 1994, Vol.33 (7B), p.4298-4302
- Ort / Verlag
- Tokyo: Japanese journal of applied physics
- Erscheinungsjahr
- 1994
- Quelle
- Alma/SFX Local Collection
- Sprache
- Englisch
- Identifikatoren
- ISSN: 0021-4922eISSN: 1347-4065DOI: 10.1143/JJAP.33.4298Titel-ID: cdi_pascalfrancis_primary_4256509
- Format
- –
- Schlagworte
- Cross-disciplinary physics: materials science, rheology, Exact sciences and technology, Materials science, Optical (ultraviolet, visible, infrared) measurements, Physics, Physics of gases, plasmas and electric discharges, Physics of plasmas and electric discharges, Plasma diagnostic techniques and instrumentation, Plasma production and heating, Plasma sources, Surface treatments