Details

Autor(en) / Beteiligte

• Tamura, N.
• MacDowell, A. A.
• Celestre, R. S.
• Padmore, H. A.
• Valek, B.
• Bravman, J. C.
• Spolenak, R.
• Brown, W. L.
• Marieb, T.
• Fujimoto, H.
• Batterman, B. W.
• Patel, J. R.

Titel

High spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron x-ray diffraction

Ist Teil von

• Applied physics letters, 2002-05, Vol.80 (20), p.3724-3726

Ort / Verlag

United States

Erscheinungsjahr

2002

Quelle

AIP Journals Complete

Beschreibungen/Notizen

• The availability of high brilliance synchrotron sources, coupled with recent progress in achromatic focusing optics and large area two-dimensional detector technology, has allowed us to develop an x-ray synchrotron technique that is capable of mapping orientation and strain/stress in polycrystalline thin films with submicron spatial resolution. To demonstrate the capabilities of this instrument, we have employed it to study the microstructure of aluminum thin film structures at the granular and subgranular levels. Due to the relatively low absorption of x-rays in materials, this technique can be used to study passivated samples, an important advantage over most electron probes given the very different mechanical behavior of buried and unpassivated materials.