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IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States), 1994, Vol.41 (6), p.1854-1863
Ort / Verlag
United States
Erscheinungsjahr
1994
Quelle
IEEE Electronic Library Online
Beschreibungen/Notizen
Oxynitrides have been grown by oxidation in N(2)O in a standard thermal oxidation furnace. Two N(2)O processes have been studied: oxidation in N(2)O only, and two-step oxidation with initial oxidation in O(2) followed by oxidation/nitridation in N(2)O. Results are presented for radiation damage at 80 and 295 K, hole trapping, interface trap creation, electron spin resonance, and hole de-trapping using thermally-stimulated current analysis. N(2)O oxynitrides do not appear to have the well-known drawbacks of NH(3)-annealed oxynitrides. Creation of interface traps during irradiation is reduced in the N(2)O oxynitrides, with the degree of improvement depending on the fabrication process