Details

Autor(en) / Beteiligte

• Whitworth, G. L.
• Zhang, S.
• Stevenson, J. R. Y.
• Ebenhoch, B.
• Samuel, I. D. W.
• Turnbull, G. A.

Titel

Solvent immersion nanoimprint lithography of fluorescent conjugated polymers

Ist Teil von

• Applied physics letters, 2015-10, Vol.107 (16)

Ort / Verlag

Melville: American Institute of Physics

Erscheinungsjahr

2015

Quelle

American Institute of Physics (AIP) Journals

Beschreibungen/Notizen

• Solvent immersion imprint lithography (SIIL) was used to directly nanostructure conjugated polymer films. The technique was used to create light-emitting diffractive optical elements and organic semiconductor lasers. Gratings with lateral features as small as 70 nm and depths of ∼25 nm were achieved in poly(9,9-dioctylfluorenyl-2,7-diyl). The angular emission from the patterned films was studied, comparing measurement to theoretical predictions. Organic distributed feedback lasers fabricated with SIIL exhibited thresholds for lasing of ∼40 kW/cm2, similar to those made with established nanoimprint processes. The results show that SIIL is a quick, convenient and practical technique for nanopatterning of polymer photonic devices.