Details

Autor(en) / Beteiligte

• Nagano, Akihisa
• Mochizuki, Takayasu
• Miyamoto, Shuji
• Amano, Sho

Titel

Laser wavelength dependence of extreme ultraviolet light and particle emissions from laser-produced lithium plasmas

Ist Teil von

• Applied physics letters, 2008-09, Vol.93 (9), p.091502-091502-3

Ort / Verlag

United States: American Institute of Physics

Erscheinungsjahr

2008

Quelle

American Institute of Physics

Beschreibungen/Notizen

• Maximum extreme ultraviolet (EUV) conversion efficiencies (CEs) of 2.3% and 1.8% were achieved in planar Li targets by using pulsed 2 ω and 1 ω Nd:YAG laser irradiation, respectively. In a forced recombination scheme, the total CE can be expected to be about 4%. The maximum kinetic energy of the lithium ion debris was found to be less than 1 keV, indicating that mirror damage caused by lithium ion debris is more easily mitigated by using a magnetic field than for tin ions. These results suggest that a Li target is a reasonable candidate for an EUV lithography source.