Details

Autor(en) / Beteiligte

• Tiwari, M. K.
• Bhalerao, G. M.
• Babu, M.
• Sinha, A. K.
• Mukherjee, C.

Titel

Investigation of metal nanoparticles on a Si surface using an x-ray standing wave field

Ist Teil von

• Journal of applied physics, 2008-03, Vol.103 (5), p.054311-054311-6

Ort / Verlag

United States: American Institute of Physics

Erscheinungsjahr

2008

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• An x-ray standing wave field generated under total external reflection condition is used to characterize the average vertical dimension of metal nanoparticles as well as their nature of dispersion on a flat surface. This approach is applied to characterize the distribution of Fe nanoparticles deposited on a silicon surface using a solution dip method. The atomic force microscopy results on these nanoparticles reinforce our interpretation. The authors believe that the present method has a strong utility in characterizing, over a large area, the morphology of the surfaces coated with nanoparticles. The method also provides element specific analysis for the nanoparticulate matter.