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Investigation of metal nanoparticles on a Si surface using an x-ray standing wave field
Ist Teil von
Journal of applied physics, 2008-03, Vol.103 (5), p.054311-054311-6
Ort / Verlag
United States: American Institute of Physics
Erscheinungsjahr
2008
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
An x-ray standing wave field generated under total external reflection condition is used to characterize the average vertical dimension of metal nanoparticles as well as their nature of dispersion on a flat surface. This approach is applied to characterize the distribution of Fe nanoparticles deposited on a silicon surface using a solution dip method. The atomic force microscopy results on these nanoparticles reinforce our interpretation. The authors believe that the present method has a strong utility in characterizing, over a large area, the morphology of the surfaces coated with nanoparticles. The method also provides element specific analysis for the nanoparticulate matter.