Sie befinden Sich nicht im Netzwerk der Universität Paderborn. Der Zugriff auf elektronische Ressourcen ist gegebenenfalls nur via VPN oder Shibboleth (DFN-AAI) möglich. mehr Informationen...
Ergebnis 6 von 930

Details

Autor(en) / Beteiligte
Titel
Fluoride Doping in Crystalline and Amorphous Indium Oxide Semiconductors
Ist Teil von
  • Chemistry of materials, 2022-04, Vol.34 (7), p.3253-3266
Ort / Verlag
United States: American Chemical Society
Erscheinungsjahr
2022
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
  • In this contribution, the structural and electronic effects of fluoride doping in both crystalline and amorphous indium oxides are investigated by both experimental and theoretical techniques. Pristine crystalline and amorphous fluoride-doped indium oxide (F:In–O) phases were prepared by solution-based combustion synthesis and sol–gel techniques, respectively. The chemical composition, environment, and solid-state microstructure of these materials were extensively studied with a wide array of state-of-the-art techniques such as UV–vis, X-ray photoelectron spectroscopy, grazing incidence X-ray diffraction, 19F and 115In solid-state NMR, high-resolution transmission electron microscopy (HR-TEM), and extended X-ray absorption fine structure (EXAFS) as well as by density functional theory (DFT) computation combined with MD simulations. Interestingly, the UV–vis data reveal that while the band gap increases upon F–-doping in the crystalline phase, it decreases in the amorphous phase. The 19F solid-state NMR data indicate that upon fluorination, the InO3F3 environment predominates in the crystalline oxide phase, whereas the InO4F2 environment is predominant in the amorphous oxide phase. The HR-TEM data indicate that fluoride doping inhibits crystallization in both crystalline and amorphous In–O phases, a result supported by the 115In solid-state NMR, EXAFS, and DFT-MD simulation data. Thus, this study establishes fluoride as a versatile anionic agent to induce disorder in both crystalline and amorphous indium oxide matrices, while modifying the electronic properties of both, but in dissimilar ways.
Sprache
Englisch
Identifikatoren
ISSN: 0897-4756
eISSN: 1520-5002
DOI: 10.1021/acs.chemmater.2c00053
Titel-ID: cdi_osti_scitechconnect_1857858
Format

Weiterführende Literatur

Empfehlungen zum selben Thema automatisch vorgeschlagen von bX