Details

Autor(en) / Beteiligte

• Zhao, Chonghang
• Kisslinger, Kim
• Huang, Xiaojing
• Bai, Jianming
• Liu, Xiaoyang
• Lin, Cheng-Hung
• Yu, Lin-Chieh
• Lu, Ming
• Tong, Xiao
• Zhong, Hui
• Pattammattel, Ajith
• Yan, Hanfei
• Chu, Yong
• Ghose, Sanjit
• Liu, Mingzhao
• Chen-Wiegart, Yu-chen Karen

Titel

Design nanoporous metal thin films via solid state interfacial dealloying

Ist Teil von

• Nanoscale, 2021-11, Vol.13 (42), p.17725-17736

Ort / Verlag

Cambridge: Royal Society of Chemistry

Erscheinungsjahr

2021

Link zum Volltext

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• Thin-film solid-state interfacial dealloying (thin-film SSID) is an emerging technique to design nanoarchitecture thin films. The resulting controllable 3D bicontinuous nanostructure is promising for a range of applications including catalysis, sensing, and energy storage. Using a multiscale microscopy approach, we combine X-ray and electron nano-tomography to demonstrate that besides dense bicontinuous nanocomposites, thin-film SSID can create a very fine (5–15 nm) nanoporous structure. Not only is such a fine feature among one of the finest fabrications by metal-agent dealloying, but a multilayer thin-film design enables creating nanoporous films on a wider range of substrates for functional applications. Through multimodal synchrotron diffraction and spectroscopy analysis with which the materials’ chemical and structural evolution in this novel approach is characterized in details, we further deduce that the contribution of change in entropy should be considered to explain the phase evolution in metal-agent dealloying, in addition to the commonly used enthalpy term in prior studies. The discussion is an important step leading towards better explaining the underlying design principles for controllable 3D nanoarchitecture, as well as exploring a wider range of elemental and substrate selections for new applications.