Details

Autor(en) / Beteiligte

• Islam, Ahmad Ehteshamul
• Susner, Michael A.
• Carpena-Núñez, Jennifer
• Back, Tyson C.
• Rao, Rahul
• Jiang, Jie
• Pachter, Ruth
• Tenney, Samuel A.
• Boeckl, John J.
• Maruyama, Benji

Titel

Defect engineering of graphene using electron-beam chemistry with radiolyzed water

Ist Teil von

• Carbon (New York), 2020-09, Vol.166 (C), p.446-455

Ort / Verlag

New York: Elsevier Ltd

Erscheinungsjahr

2020

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• Defect engineering of graphene is attractive for a wide range of applications. Here, we present a mask-less, resist-free, and fully reversible process to engineer defects in graphene using electron-beam (e-beam) chemistry with radiolyzed water. This process was performed inside a variable pressure scanning electron microscope by generating radiolysis products using reactions between the e-beam and water vapor, which in turn reacted with the graphene at the location of the probe. These reactions enabled controlled chemistry on the graphene surface at a resolution of ∼60 nm and hence created defects in precise locations defined by the e-beam. Detailed characterization and theoretical analyses suggested the presence of sp3-type defects, the density of which was tuned by varying the e-beam dose. In addition, these sp3-type defects were cycled in and out of graphene by alternating e-beam chemistry and thermal annealing. This reversibility promises future applications of e-beam chemistry in reconfigurable plasmonics and electronics. [Display omitted]