Details

Autor(en) / Beteiligte

• Yuan, Pengyu
• Wu, Jason Y
• Ogletree, D. Frank
• Urban, Jeffrey J
• Dames, Chris
• Ma, Yanbao

Titel

Adapting the Electron Beam from SEM as a Quantitative Heating Source for Nanoscale Thermal Metrology

Ist Teil von

• Nano letters, 2020-05, Vol.20 (5), p.3019-3029

Ort / Verlag

United States: American Chemical Society

Erscheinungsjahr

2020

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• The electron beam (e-beam) in the scanning electron microscopy (SEM) provides an appealing mobile heating source for thermal metrology with spatial resolution of ∼1 nm, but the lack of systematic quantification of the e-beam heating power limits such application development. Here, we systemically study e-beam heating in LPCVD silicon nitride (SiN x ) thin-films with thickness ranging from 200 to 500 nm from both experiments and complementary Monte Carlo simulations using the CASINO software package. There is good agreement about the thickness-dependent e-beam energy absorption of thin-film between modeling predictions and experiments. Using the absorption results, we then demonstrate adapting the e-beam as a quantitative heating source by measuring the thickness-dependent thermal conductivity of SiN x thin-films, with the results validated to within 7% by a separate Joule heating experiment. The results described here will open a new avenue for using SEM e-beams as a mobile heating source for advanced nanoscale thermal metrology development.