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Assessment of Ambipolar Behavior of a Tunnel FET and Influence of Structural Modifications
Ist Teil von
JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, 2012, 12(4), 48, pp.482-491
Ort / Verlag
대한전자공학회
Erscheinungsjahr
2012
Quelle
EZB Electronic Journals Library
Beschreibungen/Notizen
In the present work, comprehensive investigation of the ambipolar characteristics of two silicon (Si) tunnel field-effect transistor (TFET)architectures (i.e. p-i-n and p-n-p-n) has been carried out. The impact of architectural modifications such as heterogeneous gate (HG) dielectric, gate drain underlap (GDU) and asymmetric source/drain doping on the ambipolar behavior is quantified in terms of physical parameters proposed for ambipolarity characterization. Moreover, the impact on the miller capacitance is also taken into consideration since ambipolarity is directly related to reliable logic circuit operation and miller capacitance is related to circuit performance. KCI Citation Count: 64