Details

Autor(en) / Beteiligte

• Seok-Gyu Yoon
• Dae-Ho Yoon
• D. H. Yoon

Titel

Residual Stress and Optical Properties in a Post-Annealed Ta2O5/SiO2 Multilayer Prepared by Using Dual-Ion-Beam Sputtering

Ist Teil von

• Journal of the Korean Physical Society, 2006, 49(1), , pp.237-240

Ort / Verlag

한국물리학회

Erscheinungsjahr

2006

Link zum Volltext

Quelle

EZB Electronic Journals Library

Beschreibungen/Notizen

• The residual stress and optical properties of Ta2O5(H)/SiO2(L) single and multilayers were examined as functions of the annealing temperature (200 400 C) using dual ion beam sputtering (DIBS). The residual stress of the annealed SiO2, Ta2O5 single layer was released, and all were found to be in compressive stress when the annealing temperature ranged from 200 to 300 C. The residual stress of the as-deposited (HL) multilayer film increased as the number of layers increased. The residual stress of the (HL)3 and the (HL)4 films was released as the annealing temperature was increased. The transmittance wavelength of the (HL)4 layer shifted to a longer wavelength as the temperature was increased and the rms roughness increased. KCI Citation Count: 4