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2021 27th International Workshop on Thermal Investigations of ICs and Systems (THERMINIC), 2021, p.1-5
2021
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Autor(en) / Beteiligte
Titel
Measurement and simulation of the three-dimensional temperature field in an RF SOI chip
Ist Teil von
  • 2021 27th International Workshop on Thermal Investigations of ICs and Systems (THERMINIC), 2021, p.1-5
Ort / Verlag
IEEE
Erscheinungsjahr
2021
Quelle
IEEE Electronic Library (IEL)
Beschreibungen/Notizen
  • We present in this study a novel way to determine the three-dimensional (3D) temperature field o f a R adio Frequency Silicon On Insulator (RF SOI) electronic chip, using several resistance temperature detectors (RTDs) embedded at different locations of the chip. The RTDs are designed and placed at different locations to experimentally obtain the temperature at key locations of the chip enabling the calibration of a multiphysical numerical model that provides the 3D temperature field in the whole chip under operating conditions. The obtained results provide useful insights on the role of different parameters (e.g. used materials properties, heat source power, substrate, boundary conditions, etc.) to engineers interested in the modelling and optimization of heat transport and thermal management of electronic chips for RF applications.
Sprache
Englisch
Identifikatoren
eISSN: 2474-1523
DOI: 10.1109/THERMINIC52472.2021.9626402
Titel-ID: cdi_ieee_primary_9626402

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