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Low temperature plasma can be used to generate a variety of free radicals in an aqueous environment, and the resultant chemistry has found applications in chemical synthesis, biology, water purification, and medicine. In this work, we focus on two plasma-produced radicals: the solvated electron (\mathrm{e}_{\text{aq}}^{-}) and the hydroxyl radical ({\text{OH}}_{\text{aq}}) . Both radicals have been studied for several decades using pulse radiolysis techniques, and many of their relevant parameters, such as diffusion coefficients and reaction rate constants, are well known for the liquid phase 1 . Using these parameters, we analytically predict many important features of the interfacial chemistry by solving reaction-diffusion equations for the radicals in the liquid phase. F or example, we derive approximate spatial profiles for the concentration of \mathrm{e}_{\text{aq}}^{-} and {\text{OH}}_{\text{aq}} in terms of various plasma parameters. Our model also sets hard limits on the radical concentration and penetration depth into the solution, and it is able to predict various experimentally observed trends, such as the dependence of H 2 O 2 yield on solution pH 2 . Overall, this work elucidates some of the dominant features of the plasma-liquid interface and can serve as a useful benchmark for more complex simulations and experiments.